ALD
- Oxford FlexAL II
- Thermal/Plasma ALD
- RF generator: 600 W
- Gases available: Ar, N2, O2, H2, NH3 (can add 3 more)
- Six heated precursor line (2 currently not populated)
- Films deposited: Al2O3, HfO2, TiO2, ZrO2
- Platen temperature up to 550 degC
- Sample size: small pieces up to 6” wafers
- Load lock