Chlorine ICP
- Plasma-Therm Apex SLR
- Gases available: Ar, He, N2, O2, SF6, BCl3, Cl2
- Materials etched: GaAs, GaN, AlN, InP, Al, Cr
- ICP generator: 1000 W at 2 MHz
- RF generator: 300 W at 13.56 MHz
- OES endpoint
- Laser endpoint
- Mechanical clamp w/ He backside cooling
- Platen temperature up to 200 degC
- Sample size: small pieces up to 6″ wafers
- Load locked