Chlorine ICP

  • Plasma-Therm Apex SLR
  • Gases available: Ar, He, O2, SF6, BCl3, Cl2
  • Materials etched: GaAs, GaN, AlN, InP, Al, Cr
  • ICP generator: 1000 W at 2 MHz
  • RF generator: 300 W at 13.56 MHz
  • OES endpoint
  • Laser endpoint
  • Mechanical clamp w/ He backside cooling
  • Platen temperature up to 200 degC
  • Sample size: small pieces up to 6″ wafers
  • Load locked