Fluorine ICP
- Plasma-Therm Apex SLR
- Gases available: CF4, CHF3, C4F8, SF6, H2, O2, Ar, He
- Materials etched: Si, SiO2, SiN, SiC, Ti, W, low-k dielectrics
- ICP generator: 1000 W at 2 MHz
- RF generator: 300 W at 13.56 MHz
- OES endpoint
- Laser endpoint
- Mechanical clamp w/ He backside cooling
- Platen temperature up to 80 degC
- Sample size: small pieces up to 6″ wafers
- Load locked