Fluorine ICP

  • Plasma-Therm Apex SLR
  • Gases available: CF4, CHF3, C4F8, SF6, H2, O2, Ar, He
  • Materials etched: Si, SiO2, SiN, SiC, Ti, W, low-k dielectrics
  • ICP generator: 1000 W at 2 MHz
  • RF generator: 300 W at 13.56 MHz
  • OES endpoint
  • Laser endpoint
  • Mechanical clamp w/ He backside cooling
  • Platen temperature up to 80 degC
  • Sample size: small pieces up to 6″ wafers
  • Load locked