Sputterer

  • PVD Products
  • Six 3-inch magnetron sources
  • Three sources in confocal configuration
  • Co-deposition capable
  • Film thickness monitoring
  • RF power supplies: 2 (600 W)
  • dc power supplies: 4 (1.5 kW)
  • RF substrate bias: 300 W
  • Sample heating: 850 degC
  • Sample rotation
  • Sample size: small pieces to 6 inch wafers
  • Load lock sample transfer
  • RGA: high pressure 100 AMU
  • Recipe driven