Sputterer
- PVD Products
- Six 3-inch magnetron sources
- Three sources in confocal configuration
- Co-deposition capable
- Film thickness monitoring
- RF power supplies: 2 (600 W)
- dc power supplies: 4 (1.5 kW)
- RF substrate bias: 300 W
- Sample heating: 850 degC
- Reactive sputtering with N2 and O2
- Sample rotation
- Sample size: small pieces to 6 inch wafers
- Load lock sample transfer
- RGA: high pressure 100 AMU
- Recipe driven